Host and ancillary tool interface methodology for distributed processing

ABSTRACT

A host and ancillary tool interface methodology for distributed processing is described. The host tool manages a process, except for the generation of a product used in the process. To generate the product, the host tool provides an indication to an ancillary tool that the product is to be generated, and the ancillary tool generates the product after detection of the indication with no further intervention by the host tool. To provide the indication, the host tool preferably activates a control line whose voltage is monitored by the ancillary tool, or alternatively, sets one or more bits in a memory which is periodically checked by the ancillary tool.

FIELD OF THE INVENTION

[0001] The present invention generally relates to computer interface techniques and in particular, to a host and ancillary tool interface methodology for distributed processing.

BACKGROUND OF THE INVENTION

[0002] In the prior art system of FIG. 1, a host tool 10 includes a processor 11 managing a semiconductor process performed in a process chamber 30 on a semiconductor wafer 31 according to a process recipe stored in memory 12. Although shown as separate items in the figure, the process chamber 30 is commonly integrated with or in the host tool 10. Material sources 53 and 54 provide materials directly to the process chamber 30. For these materials, the processor 11 causes main flow control valves 73 and 74 respectively in flow lines 63 and 64 to open by activating control lines 83 and 84 with appropriate signals through input/output (I/O) ports 16 and 17 at the appropriate times according to the process recipe. Precursor material sources 51 and 52, on the other hand, provide precursor materials to a radio frequency (RF) inductively coupled plasma (ICP) torch 21 of an ancillary tool 20. For these precursor materials, the processor 11 causes main flow control valves 71 and 72 in flow lines 61 and 62 to be opened by activating control lines 81 and 82 with appropriate signals through input/output (I/O) ports 14 and 15 at the appropriate times according to the process recipe, while providing controls through bus 40 to the ancillary tool 20 so that the RF ICP torch 21 generates a product such as a chemical species from the precursor materials and provides the product to the process chamber 30 through flow line 90 for processing the semiconductor wafer 31.

[0003] In addition to managing the processing of the semiconductor wafer 31, the host tool 10 may have other important tasks to perform. Therefore, it is useful to distribute the semiconductor processing so that the ancillary tool 20 generates the product and provides it to the process chamber 30 with minimal to no supervision from the host tool 10, while at the same time, performing such function at the appropriate time according to the process recipe. When the ancillary tool 20 is manufactured and distributed by a different vendor than the host tool 10, however, the two tools may be designed for different operating systems and/or communication protocols, thus complicating the task of interfacing the two tools with each other.

OBJECTS AND SUMMARY OF THE INVENTION

[0004] Accordingly, it is an object of the present invention to provide a host and ancillary tool interface methodology for distributed processing.

[0005] Another object is to provide a host and ancillary tool interface methodology that requires minimal host tool supervision of the ancillary tool's generation of a product.

[0006] Another object is to provide a host and ancillary tool interface methodology that provides ancillary tool generation of a product in a transparent manner to the host tool.

[0007] Still another object is to provide a host and ancillary tool interface methodology that does not require host and ancillary tools to have the same operating system or communication protocol.

[0008] These and additional objects are accomplished by the various aspects of the present invention, wherein briefly stated, one aspect is a method for interfacing host and ancillary tools, comprising: activating a control line of a host tool when a product is to be provided; and generating and providing the product when activation of the control line is detected by an ancillary tool.

[0009] Another aspect is an apparatus for generating and providing a product as part of a process, comprising: a host tool configured to manage a process and activate a control line when a product is to be provided as part of the process; and an ancillary tool configured to generate and provide the product when activation of the control line is detected.

[0010] Another aspect is an apparatus for generating and providing a product as part of a process, comprising an ancillary tool configured to generate a product when the ancillary tool detects activation of a control line activated by a host tool configured to activate the control line when the product is to be provided as part of a process managed by the host tool.

[0011] Another aspect is a system for semiconductor processing, comprising: a process chamber for housing at least one semiconductor wafer for semiconductor processing; a host tool configured to manage the semiconductor processing and activate a control line when a product is to be provided to the process chamber as part of the semiconductor processing; and an ancillary tool configured to generate and provide the product to the process chamber when activation of the control line is detected.

[0012] Still another aspect is an apparatus for generating a chemical species, comprising: a product generator unit; and a detection unit configured to detect an indication provided by a host tool to generate a product as part of a process being managed by the host tool, and to activate the product generator unit to generate the product upon detecting the indication.

[0013] Yet another aspect is a method for interfacing host and ancillary tools for distributed processing of a semiconductor wafer, comprising: providing an indication to an ancillary tool when a product is to be generated and provided to a process chamber for processing a semiconductor wafer as a part of a process recipe being executed by a host tool; and automatically causing a product generator in the ancillary tool to generate and provide the product to the process chamber without further intervention from the host tool upon detecting the indication.

[0014] Additional objects, features and advantages of the various aspects of the present invention will become apparent from the following description of its preferred embodiment, which description should be taken in conjunction with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

[0015]FIG. 1 illustrates a block diagram of a prior art semiconductor processing system.

[0016]FIG. 2 illustrates a block diagram of a first embodiment of a semiconductor processing system utilizing aspects of the present invention.

[0017]FIG. 3 illustrates a block diagram of a second embodiment of a semiconductor processing system utilizing aspects of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

[0018] In FIGS. 1˜3, items in the figures that are identified by the same reference number are functionally equivalent and similarly constructed.

[0019]FIG. 2 illustrates, as an example, a block diagram of a first and preferred embodiment of a semiconductor processing system. The application in this case is similar to that described in reference to FIG. 1, in that a host tool 210 includes a processor 11 managing a semiconductor process performed in a process chamber 30 on a semiconductor wafer 31 according to a process recipe stored in memory 212. Although shown as separate items in the figures to simplify illustration of material flows, the process chamber 30 is preferably integrated with or in the host tool 210.

[0020] The process recipe in this case, however, is a modified version of that described in reference to FIG. 1, because the processor 11 of the host tool 210 in this case does not control the generation of a product which is to be generated by an ancillary tool 220 and provided to the process chamber 30 as part of the process. Therefore, that portion of the process recipe has been deleted in the modified version of the process recipe, and the deleted portion (i.e., the “product recipe”) has instead been stored in a memory 202 of the ancillary tool 220 for execution by its processor 201. Thus, although the timing of when the product is generated and provided to the process chamber 30 is still controlled by the processor 11 of the host tool 210 in accordance with the process recipe stored in its memory 212, the actual generation and providing of the product to the process chamber 30 by the ancillary tool 220 is done transparently to the host tool 210.

[0021] When it is time to provide the product to the process chamber 30 as part of the process according to the process recipe stored in memory 212, the host tool 210 provides an indication to the ancillary tool 230 that the product is to be generated. The processor 11 provides the indication in this case by activating control line 81 with an appropriate signal passed through input/output (I/O) port 14. Thus, it appears from the process recipe that the product is being provided just like any other material from a material source, such as material sources 53 and 54, directly to the process chamber 30 for processing the semiconductor wafer 31.

[0022] A detection circuit 203 in the ancillary tool 220 monitors the control line 81 and detects the indication that the product is to be generated by, for example, detecting a voltage magnitude such as 24.0 volts on the control line 81. Upon such detection, the detection circuit 203 then notifies the processor 201 so that it causes the RF ICP torch 21 to generate the product according to the product recipe stored in memory 202 and consequently, provide the product to the process chamber 30 through flow line 90.

[0023] In order to generate the product according to the product recipe, the processor 201 causes main flow control valves 71 and 72 in flow lines 61 and 62 to be opened by activating control lines 281 and 282 with appropriate signals at the appropriate times according to the product recipe so that precursor materials respectively from precursor material sources 51 and 52 are provided directly to the RF ICP torch 21.

[0024] The product in this case is a chemical species formed from the precursor materials provided by precursor material sources 51 and 52. Additional details in the generation of such chemical species using an RF ICP torch such the RF ICP torch 21 are included in commonly owned, U.S. patent application Ser. No. 10/404,216 entitled “Remote ICP Torch for Semiconductor Processing,” filed Mar. 31, 2003, which is incorporated herein by this reference.

[0025] Also to support the process recipe, material sources 53 and 54 provide materials directly to the process chamber 30 as the processor 11 causes main flow control valves 73 and 74 respectively in flow lines 63 and 64 to open by activating control lines 83 and 84 with appropriate signals through input/output (I/O) ports 16 and 17 at the appropriate times according to the process recipe.

[0026] Although this example depicts two precursor material sources, 51 and 52, and two material sources, 53 and 54, being used, it is to be appreciated that the number of such sources as well as the types of materials that they provide depends upon and varies with the process and product recipes being followed for the semiconductor processing.

[0027]FIG. 3 illustrates a block diagram of a second and embodiment of a semiconductor processing system. The application in this case is also similar to that described in reference to FIG. 1 in that a host tool 310 includes a processor 11 managing a semiconductor process performed in a process chamber 30 on a semiconductor wafer 31 according to a process recipe stored in memory 312. Although shown as separate items in the figures to simplify illustration of material flows, the process chamber 30 is preferably integrated with or in the host tool 310.

[0028] The process recipe in this case, is also a modified version of that described in reference to FIG. 1, because the processor 11 in this case also does not control the generation of a product by an ancillary tool 320. In this example, however, the host tool 310 provides a different type of indication to the ancillary tool 320 to generate the product.

[0029] The indication to generate the product in this case involves either the setting of one or more bits in a memory 302 of the ancillary tool 320 in a similar fashion as conventionally done to set bits in an interrupt flag field, or alternatively, the activation of an interrupt line coupled to the ancillary tool 320. The ancillary tool 320 then detects the indication as it would a conventional interrupt provided in an interrupt flag field or on an interrupt line, and then generates and provides the product to the process chamber 30 upon detection of the indication.

[0030] The product and its generation in this example is the same as described in reference to FIG. 2. Also, the use of precursor materials respectively from the precursor material sources 51 and 52 for the product recipe, and the use of materials respectively from the material sources 53 and 54 for the process recipe are the same as described in reference to FIG. 2.

[0031] Although the various aspects of the present invention have been described with respect to a preferred embodiment, it will be understood that the invention is entitled to full protection within the full scope of the appended claims. 

We claim:
 1. A method for interfacing host and ancillary tools, comprising: activating a control line of a host tool when a product is to be provided; and generating and providing said product when activation of said control line is detected by an ancillary tool.
 2. The method according to claim 1, wherein said activating said control line comprises providing host tool program code to said host tool to activate said control line when said product is to be provided.
 3. The method according to claim 2, wherein said host tool program code is part of a host tool program implementing a host tool recipe for semiconductor processing.
 4. The method according to claim 2, wherein said product is a chemical species.
 5. The method according to claim 4, wherein said providing said product comprises providing said chemical species to a process chamber.
 6. The method according to claim 5, wherein said process chamber is used for semiconductor processing.
 7. The method according to claim 1, wherein said generating said product comprises providing ancillary tool program code to said ancillary tool to generate said product when said control line is detected by said ancillary tool.
 8. The method according to claim 7, wherein said ancillary tool program code is part of an ancillary tool program implementing an ancillary tool recipe for semiconductor processing.
 9. The method according to claim 7, wherein said product is a chemical species.
 10. The method according to claim 9, wherein said generating said product comprises generating said chemical species from one or more precursor materials.
 11. The method according to claim 9, wherein said generating said product comprises generating said chemical species from one or more precursor materials subjected to an induced field to generate free radicals as part of said generating said chemical species.
 12. The method according to claim 9, wherein said providing said product comprises providing said chemical species to a process chamber.
 13. The method according to claim 12, wherein said process chamber is used for semiconductor processing.
 14. The method according to claim 1, wherein said control line is coupled to an input/output port of said host tool, and said ancillary tool detects activation of said control line by a voltage magnitude detected on said control line.
 15. An apparatus for generating and providing a product as part of a process, comprising: a host tool configured to manage a process and activate a control line when a product is to be provided as part of said process; and an ancillary tool configured to generate and provide said product when activation of said control line is detected.
 16. The apparatus according to claim 15, wherein said host tool includes a host tool program for managing said process and causing said host tool to activate said control line when said product is to be provided as part of said process.
 17. The apparatus according to claim 16, wherein said product is a chemical species.
 18. The apparatus according to claim 17, wherein said ancillary tool is adapted to provide said chemical species to a process chamber used for semiconductor processing.
 19. The apparatus according to claim 15, wherein said ancillary tool includes an ancillary tool program that starts to execute when activation of said control line is detected.
 20. The apparatus according to claim 19, wherein said ancillary tool program causes said ancillary tool to implement an ancillary tool recipe for generating said product.
 21. The apparatus according to claim 20, wherein said product is a chemical species.
 22. The apparatus according to claim 21, wherein said ancillary tool program causes said ancillary tool to generate said chemical species from one or more precursor materials.
 23. The apparatus according to claim 21, wherein said ancillary tool program causes said ancillary tool to generate said chemical species from one or more precursor materials subjected to an induced field to generate free radicals as part of said generation.
 24. The apparatus according to claim 21, wherein said ancillary tool is adapted to provide said chemical species to a process chamber used for semiconductor processing.
 25. The apparatus according to claim 15, wherein said control line is coupled to an input/output port of said host tool, and said ancillary tool detects activation of said control line by a voltage magnitude detected on said control line.
 26. An apparatus for generating and providing a product as part of a process, comprising an ancillary tool configured to generate a product when said ancillary tool detects activation of a control line activated by a host tool configured to activate said control line when said product is to be provided as part of a process managed by said host tool.
 27. The apparatus according to claim 26, wherein said ancillary tool includes an ancillary tool program that starts to execute when activation of said control line is detected.
 28. The apparatus according to claim 27, wherein said ancillary tool program causes said ancillary tool to implement an ancillary tool recipe for generating said product.
 29. The apparatus according to claim 28, wherein said product is a chemical species.
 30. The apparatus according to claim 29, wherein said ancillary tool program causes said ancillary tool to generate said chemical species from one or more precursor materials.
 31. The apparatus according to claim 29, wherein said ancillary tool program causes said ancillary tool to generate said chemical species from one or more precursor materials subjected to an induced field to generate free radicals as part of said generation.
 32. The apparatus according to claim 29, wherein said ancillary tool is adapted to provide said chemical species to a process chamber used for semiconductor processing.
 33. The apparatus according to claim 26, wherein said control line is coupled to an input/output port of said host tool, and said ancillary tool detects activation of said control line by a voltage magnitude detected on said control line.
 34. A system for semiconductor processing, comprising: a process chamber for housing at least one semiconductor wafer for semiconductor processing; a host tool configured to manage said semiconductor processing and activate a control line when a product is to be provided to said process chamber as part of said semiconductor processing; and an ancillary tool configured to generate and provide said product to said process chamber when activation of said control line is detected.
 35. The system according to claim 34, wherein said host tool includes a host tool program for managing said semiconductor processing and causing said host tool to activate said control line when said product is to be provided to said process chamber as part of said semiconductor processing.
 36. The system according to claim 35, wherein said product is a chemical species.
 37. The system according to claim 34, wherein said ancillary tool includes an ancillary tool program that starts to execute when activation of said control line is detected.
 38. The system according to claim 37, wherein said ancillary tool program causes said ancillary tool to implement an ancillary tool recipe for generating said product.
 39. The system according to claim 38, wherein said product is a chemical species.
 40. The system according to claim 39, wherein said ancillary tool program causes said ancillary tool to generate said chemical species from one or more precursor materials.
 41. The system according to claim 39, wherein said ancillary tool program causes said ancillary tool to generate said chemical species from one or more precursor materials subjected to an induced field to generate free radicals as part of said generation.
 42. The system according to claim 34, wherein said control line is coupled to an input/output port of said host tool, and said ancillary tool detects activation of said control line by a voltage magnitude detected on said control line.
 43. An apparatus for generating a chemical species, comprising: a product generator unit; and a detection unit configured to detect an indication provided by a host tool to generate a product as part of a process being managed by said host tool, and to activate said product generator unit to generate said product upon detecting said indication.
 44. The apparatus according to claim 43, wherein said product is a chemical species.
 45. The apparatus according to claim 44, wherein said product generator unit includes an ICP torch.
 46. The apparatus according to claim 45, wherein said ICP torch is an RF ICP torch.
 47. The apparatus according to claim 43, further comprising a memory, and said indication is provided by said host tool setting one or more bit locations in said memory.
 48. The apparatus according to claim 43, wherein said indication is provided by said host tool generating an interrupt signal, and said detection unit detects said indication by detecting said interrupt signal.
 49. The apparatus according to claim 43, wherein said indication is provided by said host tool activating a control line, and said detection unit detects said indication by detecting a voltage magnitude on said control line.
 50. A method for interfacing host and ancillary tools for distributed processing of a semiconductor wafer, comprising: providing an indication to an ancillary tool when a product is to be generated and provided to a process chamber for processing a semiconductor wafer as a part of a recipe being executed by a host tool; and automatically causing a product generator in said ancillary tool to generate and provide said product to said process chamber without further intervention from said host tool upon detecting said indication.
 51. The method according to claim 50, wherein said product is a chemical species.
 52. The method according to claim 51, wherein said product generator unit includes an ICP torch.
 53. The method according to claim 52, wherein said ICP torch is an RF ICP torch.
 54. The method according to claim 50, wherein said providing said indication comprises setting one or more bit locations in a memory of said ancillary tool.
 55. The method according to claim 50, wherein said providing said indication comprises generating an interrupt signal provided to said ancillary tool
 56. The method according to claim 50, wherein said providing said indication comprises activating a control line of said host tool, and said indication is detected by said ancillary tool by detecting a voltage magnitude on said control line. 